发明名称 |
Interconnect structures for wafer level package and methods of forming same |
摘要 |
Representative methods are disclosed for fabricating device packages having a plurality of dies, a molding compound extending along sidewalls of the plurality of dies, and a polymer layer over and contacting the molding compound. The molding compound comprises a non-planar top surface, and a total thickness variation (TTV) of a top surface of the polymer layer is less than a TTV of the non-planar top surface of the molding compound. The device package further includes a conductive feature on the polymer layer, wherein the conductive feature is electrically connected at least one of the plurality of dies. |
申请公布号 |
US9589932(B2) |
申请公布日期 |
2017.03.07 |
申请号 |
US201615174606 |
申请日期 |
2016.06.06 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Yu Chen-Hua;Liu Chung-Shi |
分类号 |
H01L21/31;H01L25/065;H01L23/31;H01L21/56;H01L21/3105;H01L23/528;H01L23/00;H01L21/48;H01L23/538;H01L21/683;H01L25/00;H01L21/768;H01L23/48;H01L23/498 |
主分类号 |
H01L21/31 |
代理机构 |
Slater Matsil, LLP |
代理人 |
Slater Matsil, LLP |
主权项 |
1. A method of forming a device package, the method comprising:
disposing a plurality of dies on a carrier; forming a molding compound over the carrier and around the plurality of dies, the molding compound comprising a non-planar top surface between adjacent dies of the plurality of dies; covering the plurality of dies with a first film layer while forming the molding compound; covering the plurality of dies with a polymer layer, the polymer layer contacting the non-planar top surface of the molding compound; planarizing a top surface of the polymer layer to have a total thickness variation (TTV) less than a TTV of the non-planar top surface of the molding compound; and forming a conductive line on the polymer layer. |
地址 |
Hsin-Chu TW |