发明名称 Interconnect structures for wafer level package and methods of forming same
摘要 Representative methods are disclosed for fabricating device packages having a plurality of dies, a molding compound extending along sidewalls of the plurality of dies, and a polymer layer over and contacting the molding compound. The molding compound comprises a non-planar top surface, and a total thickness variation (TTV) of a top surface of the polymer layer is less than a TTV of the non-planar top surface of the molding compound. The device package further includes a conductive feature on the polymer layer, wherein the conductive feature is electrically connected at least one of the plurality of dies.
申请公布号 US9589932(B2) 申请公布日期 2017.03.07
申请号 US201615174606 申请日期 2016.06.06
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Yu Chen-Hua;Liu Chung-Shi
分类号 H01L21/31;H01L25/065;H01L23/31;H01L21/56;H01L21/3105;H01L23/528;H01L23/00;H01L21/48;H01L23/538;H01L21/683;H01L25/00;H01L21/768;H01L23/48;H01L23/498 主分类号 H01L21/31
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. A method of forming a device package, the method comprising: disposing a plurality of dies on a carrier; forming a molding compound over the carrier and around the plurality of dies, the molding compound comprising a non-planar top surface between adjacent dies of the plurality of dies; covering the plurality of dies with a first film layer while forming the molding compound; covering the plurality of dies with a polymer layer, the polymer layer contacting the non-planar top surface of the molding compound; planarizing a top surface of the polymer layer to have a total thickness variation (TTV) less than a TTV of the non-planar top surface of the molding compound; and forming a conductive line on the polymer layer.
地址 Hsin-Chu TW