Apparatus for liquid treatment of wafer shaped articles and liquid control ring for use in same

摘要

An apparatus for treating a wafer-shaped article includes a rotary chuck configured to hold a wafer-shaped article of a predetermined diameter such that a surface of the wafer-shaped article facing the rotary chuck is spaced from an upper surface of the rotary chuck. A ring is mounted on the rotary chuck, and includes a first upper surface overlapping an outer peripheral edge of a wafer-shaped article when positioned on the rotary chuck and a second upper surface positioned radially inwardly of the first surface. The second upper surface is elevated relative to the first upper surface, to define an annular gap between the second upper surface and a wafer-shaped article when positioned on the spin chuck that is smaller than a distance between the first upper surface and a wafer-shaped article when positioned on the rotary chuck.

主权项

1. Apparatus for liquid treatment of a wafer-shaped article, comprising:
a rotary chuck configured to hold a wafer-shaped article of a predetermined diameter such that a surface of the wafer-shaped article facing the rotary chuck is spaced from an upper surface of the rotary chuck; a dispenser to dispense a treatment liquid onto the wafer-shaped article; and a continuous ring mounted on the rotary chuck, the continuous ring comprising a first continuous upper surface overlapping an outer peripheral edge of the wafer-shaped article when positioned on the rotary chuck and a second continuous upper surface positioned radially inwardly of the first continuous upper surface, wherein the second continuous upper surface is elevated relative to the first continuous upper surface, to define an annular gap between the second continuous upper surface and the wafer-shaped article when positioned on the rotary chuck that is smaller than a distance between the first continuous upper surface and the wafer-shaped article when positioned on the rotary chuck, and wherein the continuous ring comprises a lower surface that is spaced from and overlies a body of the rotary chuck, thereby to define an annular gas channel between the lower surface of the continuous ring and the body of the rotary chuck.