发明名称 |
Deposition mask, producing method therefor and forming method for thin film pattern |
摘要 |
A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate. |
申请公布号 |
US9586225(B2) |
申请公布日期 |
2017.03.07 |
申请号 |
US201514746727 |
申请日期 |
2015.06.22 |
申请人 |
V TECHNOLOGY CO., LTD. |
发明人 |
Sugimoto Shigeto;Kajiyama Koichi;Mizumura Michinobu;Kudo Syuji;Kimura Eriko;Aziz Hany Maher;Kajiyama Yoshitaka |
分类号 |
C23C14/04;B05B15/04;H01L51/00;C23C14/24;C23C14/34;C23C14/48;B23K26/00;H01L51/50 |
主分类号 |
C23C14/04 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
McDermott Will & Emery LLP |
主权项 |
1. A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, comprising:
a resin film having an opening pattern which penetrates through the resin film and has the same shape and dimensions as that of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate, wherein the resin film is configured to transmit visible light to allow a position of the thin film pattern on the substrate to be detected through the resin film to locate an irradiation position of laser light on the position of the thin film pattern. |
地址 |
Yokohama-Shi JP |