| 发明名称 | Lithographic apparatus and device manufacturing method | ||
| 摘要 | A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. | ||
| 申请公布号 | US9588442(B2) | 申请公布日期 | 2017.03.07 |
| 申请号 | US201615167357 | 申请日期 | 2016.05.27 |
| 申请人 | ASML NETHERLANDS B.V. | 发明人 | Hoogendam Christiaan Alexander;Derksen Antonius Theodorus Anna Maria;Donders Sjoerd Nicolaas Lambertus;Lof Joeri;Loopstra Erik Roelof;Mulkens Johannes Catharinus Hubertus;Jansen Hans;Verspay Jacobus Johannus Leonardus Hendricus;Straaijer Alexander;Streefkerk Bob |
| 分类号 | G03B27/58;G03F7/20;G03F9/00 | 主分类号 | G03B27/58 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A device manufacturing method comprising: providing a liquid to a space between a projection system and a substrate with a liquid supply system; projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate, and isolating the space from the substrate with a shutter, the shutter being located between the projection system and the substrate when the shutter isolates the space from the substrate. | ||
| 地址 | Veldhoven NL | ||