Mounting table and plasma processing apparatus

摘要

A mounting table includes an electrostatic chuck, a base, and a cylindrical sleeve. The electrostatic chuck has a top surface to be exposed to plasma and a bottom surface opposite to the top surface, and a first through-hole is formed through the electrostatic chuck. The base is bonded to the bottom surface of the electrostatic chuck by a first adhesive, and a second through-hole is formed through the base. The second through-hole communicates with the first through-hole and has a diameter larger than a diameter of the first through-hole. The sleeve is bonded to the bottom surface of the electrostatic chuck by a second adhesive while communicating with the first through-hole.

主权项

1. A mounting table comprising:
an electrostatic chuck having a top surface to be exposed to a plasma and a bottom surface opposite to the top surface, the electrostatic chuck including a first through-hole formed therethrough; a base bonded to the bottom surface of the electrostatic chuck by a first adhesive, the base including a second through-hole formed therethrough, the second through-hole communicating with the first through-hole and having a diameter larger than a diameter of the first through-hole; and a tubular sleeve, wherein the sleeve is bonded to the bottom surface of the electrostatic chuck by a second adhesive while communicating with the first through-hole, wherein the second adhesive has a higher resistance to the plasma or radicals than that of the first adhesive, wherein the first adhesive is an organic adhesive including a silicon-based material, an acrylic-based or acrylate-based material, or a polyimide silica-based material, wherein the second adhesive is an inorganic adhesive including a ceramic material, and wherein the sleeve is spaced apart from an inner wall of the second through-hole.