发明名称 |
Method for producing cycloalkyl alkyl ether compound |
摘要 |
The present invention is a method for producing a cycloalkyl alkyl ether compound comprising reacting substituted or unsubstituted cyclopentene or substituted or unsubstituted cyclohexene with an alcohol compound represented by a formula (2): R1OH (wherein R1 is a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, or a substituted or unsubstituted cycloalkyl group having 3 to 8 carbon atoms) in a gaseous state in presence of an acidic ion-exchange resin to produce a cycloalkyl alkyl ether compound represented by a formula (1): R1—O—R2 (wherein R1 is the same as defined above, and R2 is a substituted or unsubstituted cyclopentyl group or a substituted or unsubstituted cyclohexyl group), the acidic ion-exchange resin having a specific surface area of 20 to 50 m2/g, an average pore size of 20 to 70 nm, and a total exchange capacity of 4.8 to 6.0 eq/L-R wet resin. |
申请公布号 |
US9586882(B2) |
申请公布日期 |
2017.03.07 |
申请号 |
US201414780316 |
申请日期 |
2014.03.26 |
申请人 |
ZEON CORPORATION |
发明人 |
Nakano Yasushi;Sasanuma Takashi |
分类号 |
C07C41/06 |
主分类号 |
C07C41/06 |
代理机构 |
Birch, Stewart, Kolasch & Birch, LLP |
代理人 |
Birch, Stewart, Kolasch & Birch, LLP |
主权项 |
1. A method for producing a cycloalkyl alkyl ether compound comprising reacting substituted or unsubstituted cyclopentene or substituted or unsubstituted cyclohexene with an alcohol compound represented by a formula (2): R1OH (wherein R1 is a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, or a substituted or unsubstituted cycloalkyl group having 3 to 8 carbon atoms) in a gaseous state in presence of an acidic ion-exchange resin to produce a cycloalkyl alkyl ether compound represented by a formula (1): R1—O—R2 (wherein R1 is the same as defined above, and R2 is a substituted or unsubstituted cyclopentyl group or a substituted or unsubstituted cyclohexyl group),
the acidic ion-exchange resin having a specific surface area of 20 to 50 m2/g, an average pore size of 20 to 70 nm, and a total exchange capacity of 4.8 to 6.0 eq/L-R wet resin. |
地址 |
Tokyo JP |