| 发明名称 |
IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF PRODUCING ARTICLE |
| 摘要 |
An imprint apparatus according to an embodiment of the present invention includes a supply unit configured to supply an imprint material on a substrate, a pattern formation unit including a holder holding a mold, the pattern formation unit being configured to bring the mold in contact with the imprint material supplied by the supply unit to form a pattern, a prevention unit configured to supply a gas in a direction intersecting a direction along the substrate to prevent a foreign matter from attaching to the substrate, and a removal unit configured to locally supply a fluid to the substrate to remove a foreign matter on the substrate. |
| 申请公布号 |
US2017057154(A1) |
申请公布日期 |
2017.03.02 |
| 申请号 |
US201615245070 |
申请日期 |
2016.08.23 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Hayashi Tatsuya;Azuma Hisanobu;Emoto Keiji;Miyajima Yoshikazu |
| 分类号 |
B29C59/02;B05D1/00;B05C11/10;H01L21/027;B05C9/02 |
主分类号 |
B29C59/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An imprint apparatus comprising:
a supply unit configured to supply an imprint material on a substrate; a pattern formation unit including a holder holding a mold, the pattern formation unit being configured to bring the mold in contact with the imprint material supplied by the supply unit to form a pattern; a prevention unit configured to supply a gas in a direction intersecting a direction along the substrate to prevent a foreign matter from attaching to the substrate; and a removal unit configured to locally supply a fluid to the substrate to remove a foreign matter on the substrate. |
| 地址 |
Tokyo JP |
