发明名称 |
METHOD OF EVALUATING SCRATCH MARK OF MAGNETIC RECORDING MEDIUM AND METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM |
摘要 |
According to one embodiment, a method of evaluating a scratch mark includes, for a magnetic recording medium including a magnetic recording layer containing magnetic particles and a metal oxide grain boundary provided between the magnetic particles, detecting and evaluating a scratch mark based on information about the reflection intensity of light in a predetermined wavelength range. The predetermined wavelength range includes at least a second wavelength range from 600 nm to 700 nm and a first wavelength range from 300 nm to 500 nm. |
申请公布号 |
US2017062001(A1) |
申请公布日期 |
2017.03.02 |
申请号 |
US201514757456 |
申请日期 |
2015.12.23 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Watanabe Akira;Onitsuka Tsuyoshi;Hyodo Hiroyuki |
分类号 |
G11B19/04;G01N21/95 |
主分类号 |
G11B19/04 |
代理机构 |
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代理人 |
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主权项 |
1. A method of evaluating a scratch mark of a magnetic recording medium, comprising:
applying the magnetic recording medium including a magnetic recording layer containing magnetic particles and a metal oxide grain boundary provided between the magnetic particles to an optical inspection apparatus including a light source configured to emit at least light in a second wavelength range from 600 nm to 700 nm and measuring a second reflection intensity of the light in the second wavelength range; and detecting and evaluating a scratch mark on a surface of the magnetic recording medium based on a measurement result of the second reflection intensity. |
地址 |
Tokyo JP |