COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST

摘要

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):;

主权项

1. A method for forming a photoresist relief image, comprising:
a) applying on a substrate a layer of a coating composition comprising:
1) a resin; and2) a crosslinker that comprises a structure of Formula (I): wherein in Formula (I):each R is independently selected from hydrogen, optionally substituted alkyl, optionally substituted heteroalkyl, optionally substituted carbocyclic aryl, or optionally substituted heteroaryl,with at least one R group being other than hydrogen;R′ and R″ are each independently selected from hydrogen, optionally substituted alkyl or optionally substituted heteroalkyl, optionally substituted carbocyclic aryl, or optionally substituted heteroaryl; and b) applying a layer of a photoresist composition above the coating composition layer.