发明名称 NUCLEIC ACID AMPLIFICATION REACTION CONTAINER, NUCLEIC ACID AMPLIFICATION REACTION DEVICE, AND REACTION METHOD FOR AMPLIFYING NUCLEIC ACID
摘要 A nucleic acid amplification reaction container includes: a flow path which is formed between a first inner wall surface and a second inner wall surface that opposes the first inner wall surface, and has the longitudinal direction in the direction along the first inner wall surface, in which the distance between the first inner wall surface and the second inner wall surface is the distance by which nucleic acid amplification reaction liquid comes into contact with both of the first inner wall surface and the second inner wall surface in a case where the nucleic acid amplification reaction liquid is guided therein, and in which, in the section which is orthogonal to the longitudinal direction of the flow path, the length in the direction parallel to the first inner wall surface is 5 times or more the distance between the first inner wall surface and the second inner wall surface.
申请公布号 US2017056888(A1) 申请公布日期 2017.03.02
申请号 US201615245576 申请日期 2016.08.24
申请人 Seiko Epson Corporation 发明人 TAKAGI Fumio;MURAYAMA Toshiro
分类号 B01L7/00;C12P19/34;B01L3/00 主分类号 B01L7/00
代理机构 代理人
主权项 1. A nucleic acid amplification reaction container comprising: a flow path which is formed between a first inner wall surface and a second inner wall surface that opposes the first inner wall surface, and has the longitudinal direction in the direction along the first inner wall surface, wherein the distance between the first inner wall surface and the second inner wall surface is the distance by which nucleic acid amplification reaction liquid comes into contact with both of the first inner wall surface and the second inner wall surface in a case where the nucleic acid amplification reaction liquid is guided therein, and wherein, in the section which is orthogonal to the longitudinal direction of the flow path, the distance in the direction parallel to the first inner wall surface is 5 times or more the distance between the first inner wall surface and the second inner wall surface.
地址 Tokyo JP