发明名称 |
PRODUCTION METHOD FOR COMPOSITION CONTAINING 1,2-DICHLORO-3,3,3-TRIFLUOROPROPENE (HCFO-1223xd) AND/OR 1,1,2-TRICHLORO-3,3,3-TRIFLUOROPROPENE (CFO-1213xa) |
摘要 |
The present invention provides a method that produces a composition containing 1223xd and/or 1213xa by a gas-phase reaction, and that achieves production efficiency higher than known methods. The present invention provides a method for producing a composition containing at least one fluorine-containing olefin selected from 1,2-dichloro-3,3,3-trifluoropropene (HCFO-1223xd) and 1,1,2-trichloro-3,3,3-trifluoropropene (CFO-1213xa), the method comprising subjecting at least one starting compound selected from a chlorine-containing alkane represented by Formula (1-1): CF3CHXCHX2, wherein each X is independently H or Cl, with the proviso that at least one X represents Cl, and a chlorine-containing alkene represented by Formula (1-2): CF3CX═CX2, wherein each X is independently H or Cl, with the proviso that at least one X represents Cl, to a gas-phase oxychlorination reaction in a temperature range of 380° C. or lower in the presence of oxidative gas and hydrogen chloride gas. |
申请公布号 |
US2017057891(A1) |
申请公布日期 |
2017.03.02 |
申请号 |
US201515307956 |
申请日期 |
2015.05.14 |
申请人 |
DAIKIN INDUSTRIES, LTD. |
发明人 |
KARUBE Daisuke;OHKUBO Shun;TAKAKUWA Tatsuya |
分类号 |
C07C17/06;C07C17/383 |
主分类号 |
C07C17/06 |
代理机构 |
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代理人 |
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主权项 |
1. A method for producing a composition containing at least one fluorine-containing olefin selected from 1,2-dichloro-3,3,3-trifluoropropene (HCFO-1223xd) and 1,1,2-trichloro-3,3,3-trifluoropropene (CFO-1213xa),
the method comprising subjecting at least one starting compound selected from a chlorine-containing alkane represented by Formula (1-1): CF3CHXCHX2, wherein each X is independently H or Cl, with the proviso that at least one X represents Cl, and a chlorine-containing alkene represented by Formula (1-2): CF3CX═CX2, wherein each X is independently H or Cl, with the proviso that at least one X represents Cl,to a gas-phase oxychlorination reaction in a temperature range of 380° C. or lower in the presence of oxidative gas and hydrogen chloride gas. |
地址 |
Osaka JP |