| 发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME |
| 摘要 |
A semiconductor device includes active pillars protruding from a semiconductor substrate and spaced apart from each other in a first direction and a second direction that is perpendicular to the first direction, a word line extending in the first direction between the active pillars, a drain region disposed in an upper portion of each of the active pillars, and a separation pattern provided between the word line and the drain region. A bottom surface of the separation pattern is disposed at a lower level than a bottom surface of the drain region. |
| 申请公布号 |
US2017062575(A1) |
申请公布日期 |
2017.03.02 |
| 申请号 |
US201615238721 |
申请日期 |
2016.08.16 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
SONG JUNGWOO;LEE JAEKYU;KAHNG JAEROK;KIM YongJun |
| 分类号 |
H01L29/40;H01L27/22;H01L27/108;H01L29/78;H01L29/66 |
主分类号 |
H01L29/40 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A semiconductor device, comprising:
active pillars protruding from a semiconductor substrate, the active pillars spaced apart from each other in a first direction and a second direction that is substantially perpendicular to the first direction; a word line extending in the first direction between the active pillars; a drain region disposed in an upper portion of each of the active pillars; and a separation pattern provided between the word line and the drain region, wherein a bottom surface of the separation pattern is disposed at a level that is lower than a level of a bottom surface of the drain region. |
| 地址 |
Suwon-si KR |
