| 发明名称 |
OVERLAY DESIGN OPTIMIZATION |
| 摘要 |
A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range. |
| 申请公布号 |
US2017061066(A1) |
申请公布日期 |
2017.03.02 |
| 申请号 |
US201515119306 |
申请日期 |
2015.02.16 |
| 申请人 |
NOVA MEASURING INSTRUMENTS LTD. |
发明人 |
BARAK Gilad;VERDENE Tal;YACHINI Michal;SHAFIR Dror;MOON Changman;WOLFLING Shay |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A sample comprising an overlay target comprising at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range. |
| 地址 |
Rehovot IL |
