PHOTOMASK CLEANING APPARATUS, METHOD OF CLEANING A PHOTOMASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

摘要

Disclosed is a method. The method includes placing a photomask on a receiver of a cleaning apparatus, removing adhesive residue from the photomask by irradiating laser on the adhesive residue, attaching a pellicle to the photomask, and exposing a semiconductor substrate to a light using the photomask, wherein the irradiating laser repeatedly pauses and restarts during the removing of the adhesive residue.

主权项

1. A method comprising:
placing a photomask on a receiver of a cleaning apparatus; and removing adhesive residue from the photomask by irradiating laser on the adhesive residue, wherein the irradiating laser repeatedly pauses and restarts during the removing of the adhesive residue.