发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 This photosensitive resin composition contains an alkali-soluble polymer (A), a compound (B) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the alkali-soluble polymer (A) has a glass transition temperature (Tgtotal) determined by mathematical formula (I) (in mathematical formula (I), Wi represents the mass of each comonomer forming the alkali-soluble polymer, Tgi represents the glass transition temperature when each of the comonomers of the alkali-soluble polymer is a homopolymer, Wtotal represents the total mass of the alkali-soluble polymer, and n represents the total number of types of the comonomers forming the alkali-soluble polymer) not higher than 100°C, and the compound (B) having an ethylenic double bond contains a compound that has an ethylenic double bond and a triazine-trione structure.
申请公布号 WO2017033868(A1) 申请公布日期 2017.03.02
申请号 WO2016JP74276 申请日期 2016.08.19
申请人 ASAHI KASEI KABUSHIKI KAISHA 发明人 YOSHIDA, Masanori;KUNIMATSU, Shinichi;NISHIMOTO, Hideaki
分类号 G03F7/033;C08F2/50;G03F7/004;G03F7/027;G03F7/40;H05K3/06;H05K3/18 主分类号 G03F7/033
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