发明名称 High Resolution Projection Micro-Stereolithography System And Method
摘要 A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.
申请公布号 US2017057162(A1) 申请公布日期 2017.03.02
申请号 US201615352051 申请日期 2016.11.15
申请人 Spadaccini Christopher M.;Weisgraber Todd;Farquar George;Gemberling Steven;Fang Nicholas;Alonso Matthew;Xu Jun;Lee Howon 发明人 Spadaccini Christopher M.;Weisgraber Todd;Farquar George;Gemberling Steven;Fang Nicholas;Alonso Matthew;Xu Jun;Lee Howon
分类号 B29C67/00;B33Y30/00;G02B5/00;G03H1/04;G02B27/56;G02B1/00;B33Y10/00;G03H1/00 主分类号 B29C67/00
代理机构 代理人
主权项 1. A holographic projection micro-stereolithography (PμSL) system, comprising: a bath containing a photosensitive resin; and at least two light projection systems, each projection system comprising a light source; and a spatial light modulator (SLM) adapted to produce a digital image when illuminated by the light source, wherein the at least two light projection systems are arranged to holographically interfere said digital images in the photosensitive resin to volumetrically cure select regions thereof in a holographic interference pattern.
地址 Oakland CA US