SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

摘要

A substrate treatment device and a substrate treatment method are disclosed. The disclosed substrate treatment device comprises: an emissivity setting unit for inputting the emissivity of a liquid chemical coming in contact with a substrate, or the emissivity on an interface at which the substrate and the liquid chemical come in contact with each other; a radiant energy input unit for inputting the radiant energy emitted from the liquid chemical or the interface; and a calculation unit for calculating a calculation temperature of the liquid chemical or the interface on the basis of the emissivity and the radiant energy.