| 发明名称 |
Substrate Processing Apparatus |
| 摘要 |
Provided are substrate processing apparatuses including a temperature measurement unit. The substrate processing apparatus comprises a chamber including a substrate processing region, a dielectric sheet that is disposed on the substrate processing region and includes an insertion hole and a temperature measurement unit that is disposed on the dielectric sheet to measure the temperature of the dielectric sheet, and has a screw portion inserted into the insertion hole, wherein each of the insertion hole and the screw portion has thread helixes meshed with each other. |
| 申请公布号 |
US2017062245(A1) |
申请公布日期 |
2017.03.02 |
| 申请号 |
US201615142629 |
申请日期 |
2016.04.29 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Hong Jung-Pyo;KIM Kwang-Nam;KWON Sang-Dong;SUN Jong-Woo;OH Sang-Rok;JANG Yong-Moon |
| 分类号 |
H01L21/67;H01J37/32 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing apparatus, comprising:
a chamber including a substrate processing region; a dielectric sheet disposed on the substrate processing region, wherein the dielectric sheet comprises an insertion hole; and a temperature measurement unit disposed on the dielectric sheet to measure a temperature of the dielectric sheet, wherein the temperature measurement unit comprises a screw portion inserted into the insertion hole, and wherein each of the insertion hole and the screw portion has thread helixes meshed with each other. |
| 地址 |
Suwon-si KR |
