METHOD FOR MANUFACTURING ANTI-REFLECTIVE SURFACE USING PLASMA ETCHING, AND SUBSTRATE HAVING ANTI-REFLECTIVE SURFACE FORMED THEREON

摘要

The present invention relates to a method for manufacturing an anti-reflective surface, which controls an anti-reflective structure layer, which is formed through repeated controls of plasma dry etching and inorganic deposition, with various structures, and can thus enhance durability and secure excellent light transmittance and anti-reflection effect while imparting functionalities such as easy cleaning, contamination resistance, scratch resistance, etc.; and to a substrate having an anti-reflective surface formed thereon.