SENSOR ARRANGEMENT FOR A LITHOGRAPHY SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR OPERATING A LITHOGRAPHY SYSTEM

摘要

A sensor arrangement (1) for detecting a position of an optical element in a lithography system, wherein the sensor arrangement (1) comprises: a first capacitive sensor device (2) which has a position-dependent variable first sensor capacity (CCS1) detectable with the aid of a first excitation signal (Vex1); a second capacitive sensor device (3) which has a position-dependent variable second sensor capacity (CCS2) detectable with the aid of a second excitation signal (Vex2); and comprising a control device (8) which is configured to generate the first and the second excitation signal (Vex1, Vex2) in such a way that charges, present at a parasitic capacity which can be associated with the first sensor device (2), compensate at least partially using charges, present at a parasitic capacity which can be associated with the second sensor device (3), via a signal path outside of the first and/or the second excitation signal path. The sensor arrangement can be favorably used in a lithography system and enables a high read-out and actuation frequency for sensor elements and actuators.