LIQUID PRECURSOR DELIVERY SYSTEM

摘要

Disclosed is a liquid precursor delivery system that enables a thin film deposition process to be performed at a low temperature like 350° C. or lower in a process of manufacturing semiconductor devices or displays. The liquid precursor delivery system includes an aerosol generator, a vaporizer, and a vapor storage tank. The aerosol generator changes a liquid precursor into an aerosol precursor using ultrasonic vibrations. The vaporizer has a heater block in which a plurality of sloped plate-shaped heaters is arranged in a zigzag form and in which the aerosol precursor changes into a gas precursor by colliding with the heaters and thus obtaining heat energy. The vapor storage tank stores the gas precursor while maintaining a constant pressure and temperature of the gas precursor and delivers the gas precursor to a process chamber when a thin film deposition process is performed.

主权项

1. A liquid precursor delivery system, comprising:
an aerosol generator that changes a liquid precursor into an aerosol precursor using ultrasonic vibrations; a vaporizer having a heater block in which a plurality of sloped plate-shaped heaters is arranged in a zigzag form and in which the aerosol precursor transferred from the aerosol generator changes into a gas precursor by colliding with the heaters and thus obtaining heat energy generated due to the collision; and a vapor storage tank that stores the gas precursor while maintaining a constant pressure and temperature of the gas precursor and delivers the gas precursor to a chamber when a thin film deposition process is performed.