发明名称 |
AN ELECTRON BEAM FOCUSING SYSTEM WITH A DIELECTRIC MATERIAL BASED FOCUSING ELEMENT |
摘要 |
An electron beam focusing system with a dielectric material based focusing element An electron beam focusing system (1) focuses an electron beam onto a desired focal spot (9) on a target (99). The system includes an electron beam source (10) to provide the electron beam (5) and a focusing element (20) to receive the electron beam and to focus the electron beam onto the desired focal spot on the target. The focusing element is a three dimensional structure (21) having a beam input end (22), a body (30) and a beam output end (28). The beam input end receives the electron beam provided by the electron beam source. The beam output end provides a focused electron beam (7) directed towards the desired focal spot on the target. The body is made of a dielectric material and tapers along an axis disposed between the beam input end and the beam output end. The body encloses a hollow space (32) for a beam path (34) extending from the beam input end to the beam output end. |
申请公布号 |
WO2017034432(A1) |
申请公布日期 |
2017.03.02 |
申请号 |
WO2015RU00532 |
申请日期 |
2015.08.21 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
BONDARENKO, Taras Vladimirovich;BOTYACHKOVA, Alexandra Igorevna;KARPINSKIY, Gennadiy Gennadievich |
分类号 |
H01J35/14;G21K1/087 |
主分类号 |
H01J35/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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