发明名称 AN ELECTRON BEAM FOCUSING SYSTEM WITH A DIELECTRIC MATERIAL BASED FOCUSING ELEMENT
摘要 An electron beam focusing system with a dielectric material based focusing element An electron beam focusing system (1) focuses an electron beam onto a desired focal spot (9) on a target (99). The system includes an electron beam source (10) to provide the electron beam (5) and a focusing element (20) to receive the electron beam and to focus the electron beam onto the desired focal spot on the target. The focusing element is a three dimensional structure (21) having a beam input end (22), a body (30) and a beam output end (28). The beam input end receives the electron beam provided by the electron beam source. The beam output end provides a focused electron beam (7) directed towards the desired focal spot on the target. The body is made of a dielectric material and tapers along an axis disposed between the beam input end and the beam output end. The body encloses a hollow space (32) for a beam path (34) extending from the beam input end to the beam output end.
申请公布号 WO2017034432(A1) 申请公布日期 2017.03.02
申请号 WO2015RU00532 申请日期 2015.08.21
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 BONDARENKO, Taras Vladimirovich;BOTYACHKOVA, Alexandra Igorevna;KARPINSKIY, Gennadiy Gennadievich
分类号 H01J35/14;G21K1/087 主分类号 H01J35/14
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