SUBSTRATE PROCESSING APPARATUS

摘要

A cleaning drying processing unit includes a lower spin chuck, a splash prevention cup, and a storage member. The splash prevention cup is provided to surround the lower spin chuck, and has an annular opening that can be opposite to an outer peripheral end of a substrate rotated by the lower spin chuck. A lower portion of the splash prevention cup is stored in the storage member. Cleaning and drying processing using a cleaning liquid are performed on the substrate rotated by the lower spin chuck. At this time, the splash prevention cup is supported such that the annular opening is opposite to the outer peripheral end of the substrate. Gas in a space opposite to the annular opening is sucked from the annular opening through a first annular space of the splash prevention cup and a second annular space in the storage member.

主权项

1. A substrate processing apparatus comprising:
a substrate holder that holds and rotates a substrate about a vertical axis; a processing liquid supplier that supplies a processing liquid to the substrate held by the substrate holder; a splash preventer configured to receive the processing liquid splashed to surroundings from the rotating substrate; a storage that stores a lower portion of the splash preventer; a driver that moves the splash preventer in an up-and-down direction relative to the storage; and a gas discharger, wherein the splash preventer includes a first inner wall provided to surround an inner space including the substrate held by the substrate holder and a region lower than the substrate, a first outer wall provided to surround outside of the first inner wall, a coupler that couples the first inner wall to the first outer wall such that a first annular space is formed between the first inner wall and the first outer wall, and an annular outer upper member connected to the first outer wall to cover an upper portion of the first annular space, an annular opening being able to be opposite to an outer peripheral end of the substrate held by the substrate holder is formed between the first inner wall and the annular outer upper member, the storage includes a second inner wall provided to surround the inner space, a second outer wall provided to surround outside of the second inner wall, and a bottom member that couples the second inner wall to the second outer wall such that a second annular space is formed between the second inner wall and the second outer wall, the lower portion of the splash preventer is stored in the second annular space of the storage to be movable in the up-and-down direction such that the first annular space and the second annular space of the splash preventer communicate with each other, and the gas discharger is provided to suck gas in the inner space through the annular opening, the first annular space and the second annular space to discharge the gas from the second annular space with the annular opening being opposite to the peripheral end of the substrate held by the substrate holder.