| 发明名称 |
METHOD FOR REMOVING ALUMINUM FLUORIDE CONTAMINATION FROM SEMICONDUCTOR PROCESSING EQUIPMENT |
| 摘要 |
Embodiment disclosed herein generally relate to a method for removing aluminum fluoride contamination from semiconductor processing equipment. A method for cleaning semiconductor processing equipment is disclosed herein. The method includes maintaining a container of water at a temperature of between 50 degrees Celsius and 100 degrees Celsius and soaking a semiconductor processing equipment having surface contamination comprising aluminum fluoride in the water, wherein the semiconductor processing equipment is comprised of a material having a solubility directly related to the temperature of the water. |
| 申请公布号 |
US2017056935(A1) |
申请公布日期 |
2017.03.02 |
| 申请号 |
US201514839857 |
申请日期 |
2015.08.28 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
GOPALAN Ramesh;PAREEK Yogita;WANG Jianqi;LO Sio On;PAPKE Kevin A. |
| 分类号 |
B08B3/08;B08B3/10;B08B3/12 |
主分类号 |
B08B3/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for cleaning semiconductor processing equipment, the method comprising:
maintaining a container consisting essentially of water at a temperature of between 50 degrees Celsius and 100 degrees Celsius; and soaking a semiconductor processing equipment having surface contamination comprising aluminum fluoride in the water. |
| 地址 |
Santa Clara CA US |
