发明名称 |
METHODS OF FORMING MAGNETIC DEVICES WITH VARIABLE OVERCOATS |
摘要 |
Methods that include depositing a first layer over the entire surface of a structure, the structure having a magnetic reader and a magnetic writer, wherein the magnetic reader and the magnetic writer are positioned adjacent to each other on a substrate and the magnetic writer includes a near field transducer (NFT); depositing a second layer over the entire surface of the first layer; depositing a photoresist material layer over the entire surface of the second layer, the photoresist material layer having a bottom surface in contact with the second layer and an opposing top surface; exposing the photoresist material layer to radiation through the bottom surface of the photoresist material layer via the NFT to form a first exposed region; and exposing the photoresist material layer to radiation through the top surface of the photoresist material layer to form a second exposed region. |
申请公布号 |
US2017061994(A1) |
申请公布日期 |
2017.03.02 |
申请号 |
US201615248682 |
申请日期 |
2016.08.26 |
申请人 |
SEAGATE TECHNOLOGY LLC |
发明人 |
Stephan Joseph Michael;Cole Douglas H.;Buettner Daniel Richard |
分类号 |
G11B5/31 |
主分类号 |
G11B5/31 |
代理机构 |
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代理人 |
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主权项 |
1. A method comprising:
depositing a first layer over the entire surface of a structure, the structure comprising a magnetic reader and a magnetic writer, wherein the magnetic reader and the magnetic writer are positioned adjacent to each other on a substrate and the magnetic writer comprises a near field transducer (NFT); depositing a second layer over the entire surface of the first layer; depositing a photoresist material layer over the entire surface of the second layer, the photoresist material layer having a bottom surface in contact with the second layer and an opposing top surface; exposing the photoresist material layer to radiation through the bottom surface of the photoresist material layer via the NFT to form a first exposed region; and exposing the photoresist material layer to radiation through the top surface of the photoresist material layer to form a second exposed region. |
地址 |
Cupertino CA US |