发明名称 SURFACE MEASURING DEVICE AND METHOD THEREOF
摘要 A surface measuring device includes a rotary platform, a shifting lever, a measuring module, and a control module. The rotary platform carries an object under test and rotates the object under test at a rotating speed. The shifting lever is above the rotary platform. The measuring module disposed on the shifting lever moves to measurement positions on the shifting lever and performs a surface height measurement at a sampling frequency to sampling points on a surface of the object under test when located at one measurement position. The control module selectively adjusts the rotational speed for the rotary platform or the sampling frequency for the measuring module according to the measurement position of the measuring module on the shifting lever in order to fit a distance between the sampling points on at least one part of the surface of the object under test to a sampling rule.
申请公布号 US2017059310(A1) 申请公布日期 2017.03.02
申请号 US201514934607 申请日期 2015.11.06
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHO Chia-Hung;CHUANG Kai-Ping;TSAI Ming-Cheng
分类号 G01B11/30 主分类号 G01B11/30
代理机构 代理人
主权项 1. A surface measuring device, comprising: a rotary platform configured to bear an object under test and turn the object under test at a rotational speed; a shifting lever disposed above the rotary platform; a measuring module disposed on the shifting lever and configured to move to measurement positions on the shifting lever and perform a surface height measurement at a sampling frequency to sampling points on a surface of the object under test when the measuring module is located at one of the measurement positions; and a control module configured to selectively adjust the rotational speed for the rotary platform or adjust the sampling frequency for the measuring module according to the measurement position of the measuring module on the shifting lever in order to fit a distance between the sampling points on at least one part of the surface of the object under test to a sampling rule.
地址 Hsinchu TW