发明名称 濾過装置
摘要 PROBLEM TO BE SOLVED: To provide a filter that can treat large flux of treatment water containing removal objects such as silicon scraps and dehydrate the treatment water at a high level.SOLUTION: In a filter 10, a filter membrane 16 is submerged in treatment water 34 stored in a treatment tank 14. A predetermined suction pressure is applied to the internal space of the filter membrane 16 by a pump 24 to stack a sedimentary layer 32 composed of removal objects on a filter surface 16A of the filter membrane 16 while filtering the treatment water 34 with the filter membrane 16. When the rate of filtered water is reduced, pressure is applied to the filter membrane 16 to peel the sedimentary layer 32 off the filter membrane and to deposit it at a lower part of the treatment tank 14.
申请公布号 JP6088359(B2) 申请公布日期 2017.03.01
申请号 JP20130117282 申请日期 2013.06.03
申请人 パナソニック株式会社;株式会社明電舎 发明人 梅沢 浩之;立木 悦二
分类号 C02F1/44;B01D65/02;B01D69/14;B24B57/02 主分类号 C02F1/44
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