发明名称 荷電粒子ビーム描画装置、試料面へのビーム入射角調整方法、および荷電粒子ビーム描画方法
摘要 A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.
申请公布号 JP6087154(B2) 申请公布日期 2017.03.01
申请号 JP20130007682 申请日期 2013.01.18
申请人 株式会社ニューフレアテクノロジー 发明人 中山 貴仁;東矢 高尚
分类号 H01L21/027;G03F7/20;H01J37/305 主分类号 H01L21/027
代理机构 代理人
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