| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment method, in which a processing object electrostatically attracted by a stage can be released as soon as possible with a simple construction.SOLUTION: In a vacuum treatment chamber 1a, a processing object W is electrostatically attracted by a chuck plate 52 of an electrostatic chuck mounted on a surface of a metallic base 51. A gas to be excited into plasma is introduced into the vacuum treatment chamber evacuated. An electric power is applied to an electrode 2 disposed in that vacuum treatment chamber thereby to establish a plasma atmosphere, in which the processing object W is subjected to the plasma treatment. A potential of the base is made floating, and a positive potential is applied to the base for a predetermined time period for the plasma treatment. |
