| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in roughness performance such as line width roughness, uniformity of a local pattern dimension, an exposure latitude and dry etching durability, and an active ray-sensitive or radiation-sensitive resin composition used for the above method, a resist film, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The method for forming a pattern includes the steps of: (1) forming a film by using an active ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit (A) including a N-methylol type moiety structure; (2) exposing the film; and (3) forming a negative pattern by developing the exposed film by using a developing solution containing an organic solvent. The present invention also discloses an active ray-sensitive or radiation-sensitive resin composition to be used for the above method, and a resist film, a method for manufacturing an electronic device, and an electronic device. |
