发明名称 高純度ネオジムの製造方法、高純度ネオジム、高純度ネオジムからなるスパッタリングターゲット及び高純度ネオジムを成分とする希土類磁石
摘要 PROBLEM TO BE SOLVED: To provide a technique capable of providing, both efficiently and stably, a high-purity neodymium, a sputtering target comprising a high-purity neodymium, and a thin film for a rare earth magnet using a high-purity neodymium as a component.SOLUTION: In a method for manufacturing a high-purity neodymium having a gas component-excluded purity of 4N5 or higher, a neodymium batch having a purity of 4N or higher is prepared by reducing, with distilled calcium, a raw neodymium fluoride ingredient having a gas component-excluded purity of 4N or higher, and after the neodymium has been skull-melted and then cooled gradually so as to prepare a neodymium ingot, the obtained skull ingot is cut so as to remove therefrom a bottom portion in which a segregated oxide layer segment exists, and the remaining neodymium ingot is melted with electron beams so as to remove therefrom volatile substances. The method for manufacturing a high-purity neodymium stipulates a C content of 100 wt.ppm or less, an O content of 50 wt.ppm or less, Al and Fe contents of 10 wt.ppm or less each, and a Cu content of 1 wt.ppm or less.
申请公布号 JP6087186(B2) 申请公布日期 2017.03.01
申请号 JP20130066337 申请日期 2013.03.27
申请人 JX金属株式会社 发明人 高畑 雅博
分类号 C22B59/00;C22B5/04;C22B9/16;C22B9/22;C22C28/00;C23C14/34 主分类号 C22B59/00
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