| 发明名称 |
IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND TARGET OBJECT COATING METHOD |
| 摘要 |
A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate. |
| 申请公布号 |
EP3073322(A3) |
申请公布日期 |
2017.03.01 |
| 申请号 |
EP20160152367 |
申请日期 |
2010.09.29 |
| 申请人 |
SNU R&DB Foundation |
发明人 |
KWON, Sung Hoon;CHUNG, Sueun;LEE, Seungah;JANG, Jisung;HAN, Sangkwon |
| 分类号 |
G03F7/20;B29C35/08;C23C16/52;G03F7/16;G03F9/00;H01L21/027;H01L21/56;H01L21/66;H01L23/00;H01L23/31;H01L23/433;H01L33/44 |
主分类号 |
G03F7/20 |
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