| 摘要 |
A charged particle beam drawing apparatus draws a plurality of cut patterns on a plurality of first linear patterns arranged to extend in a first direction and align themselves at a predetermined pitch P in a second direction perpendicular to the first direction. The plurality of cut patterns are drawn so that an interval Ai in the second direction between the centers of each pair of cut patterns adjacent to each other in the second direction (i is a number which specifies the pair) satisfies a relation: Ai=m1X (m1=1, 2, 3, . . . ) where X is a dimension defined by the pitch P. |
