| 摘要 |
PROBLEM TO BE SOLVED: To provide a high accuracy evaluation method of a polymer for a semiconductor lithography, and a manufacturing method of the polymer for the semiconductor lithography including the evaluation method.SOLUTION: There is provided an evaluation method of a molecular weight M of a polymer for a semiconductor lithography including selecting a standard sample (R) having a molecular weight (M) satisfying a formula (I) for a sample to be an evaluation target (S) and a molecular weight (M) of the sample to be the evaluation target (S), 0.7≤(M)/(M)≤1.3 (I), continuously conducting measurement of the molecular weight M of the sample to be the evaluation target (S) and the standard sample (R), and evaluating the molecular weight of the sample to be the evaluation target (S) by using &Dgr;M, which is a difference (M-M) between the molecular weight (M) of the sample to be the evaluation target (S) and the molecular weight (M) of the standard sample (R). |
