发明名称 |
METHOD FOR THE PREPARATION OF TRICHLOROMETHYL-GROUP-SUBSTITUTED BENZENE |
摘要 |
The present application relates to a method for photochlorination, and specifically to photochlorination by a photochemical reaction of an aromatic compound with gaseous chlorine so as to prepare a trichloromethyl-substituted benzene, and to a method using bis-(trichloromethyl)-benzene as the trichloromethyl-substituted benzene to prepare by further reaction bis-(chloroformyl)-benzene. Through the control of temperature, illuminance and consumption of gaseous chlorine, the method of this application can greatly improve the purity of trichloromethyl-substituted benzene and further prepare polymer-grade bis-(chloroformyl)-benzene with low cost. The present application also relates to a method for purifying trichloromethyl-substituted benzene, and specifically to a method for purifying trichloromethyl-substituted benzene via molecular distillation. The present application further relates to a photochlorination reactor for use in photochlorination reactions (such as those of the present application). |
申请公布号 |
EP3045440(A4) |
申请公布日期 |
2017.03.01 |
申请号 |
EP20140843701 |
申请日期 |
2014.09.12 |
申请人 |
Shanghai Fanglun New Material Technology Co. Ltd.;Wang Nongyue |
发明人 |
WANG, Nongyue;QU, Xiongwei;LI, Guohua;ZHAO, Quanzhong;SHAO, Jianming;WEN, Guoqiang |
分类号 |
C07C17/14;B01J19/12;C07C17/10;C07C17/12;C07C17/38;C07C22/04;C07C51/60;C07C53/44 |
主分类号 |
C07C17/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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