主权项 |
1. A photoresist overcoat composition, comprising:
a matrix polymer comprising a unit formed from a monomer of the following general formula (I): wherein: R1 is chosen from hydrogen and optionally substituted C1 to C3 alkyl; R2 is chosen from optionally substituted C1 to C15 alkyl; X1 is oxygen, sulfur or is represented by the formula NR3, wherein R3 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; and Z1 is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —COO— and —CONR4— wherein R4 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; and an additive polymer comprising a unit formed from a monomer of the following general formula (II): wherein: R10 is chosen from hydrogen and optionally substituted C1 to C3 alkyl; R11 is chosen from optionally substituted C1 to C15 alkyl; X2 is oxygen, sulfur or is represented by the formula NR12, wherein R12 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; and Z3 is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —NHSO2—, —COO— and —CONR13— wherein R13 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; a basic quencher; and an organic solvent; wherein the additive polymer has a lower surface energy than a surface energy of the matrix polymer, and wherein the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition; and wherein the composition is free of photoacid generator compounds. |