发明名称 Nanostructured titania semiconductor material and its production process
摘要 A nanostructured titania semiconductor material termed TSG-IMP having a predetermined crystal size is produced by a sol-gel method by adding a titanium alkoxide to an alcoholic solution, adding an acid to the alcoholic solution, subjecting the acidic solution to agitation under reflux conditions; stabilizing the medium and adding bidistilled water under reflux until gelation; subjecting the gel to aging until complete formation of the titania which is dried and calcined.
申请公布号 US9580332(B2) 申请公布日期 2017.02.28
申请号 US201313922952 申请日期 2013.06.20
申请人 INSTITUTO MEXICANO DEL PETROLEO 发明人 Castillo Cervantes Salvador;Mejia Centeno Isidro;Camposeco Solis Roberto;Moran Pineda Florencia Marina;Navarrete Bolanos Juan;Montoya De La Fuente J. Ascension;Vargas Escudero Alfredo
分类号 C01G23/053;B01J21/06 主分类号 C01G23/053
代理机构 Dickinson Wright PLLC 代理人 Dickinson Wright PLLC
主权项 1. A nanostructured titania semiconductor material TSG-IMP consisting of crystalline amorphous phases: anatase, brookite and rutile, in the following proportions:ActivationCrystalline Amorphous phase (%)TemperatureGeneral(° C.)AnataseBrookiteRutile200-30060-7030-40350-55075-8012-175-12.
地址 Mexico City MX