发明名称 System and method of cleaning FOUP
摘要 A system for cleaning a container such as semiconductor wafer carrier includes a housing, a cleaning unit in the housing, an analyzing unit within the housing, and a vacuum unit within the housing. The cleaning unit comprises a cleaning chamber, and is configured to spray a cleaning medium into the container in the cleaning chamber and dry the container. The analyzing unit is configured to analyze air inside the container coming out of the cleaning chamber, and provide a testing result for each ingredient of possible airborne molecular contamination (AMC) and humidity. The vacuum unit comprises a vacuum chamber configured to apply vacuum onto a container when the testing result for an ingredient is higher than a respective threshold.
申请公布号 US9579697(B2) 申请公布日期 2017.02.28
申请号 US201213706403 申请日期 2012.12.06
申请人 Taiwan Semiconductor Manufacturing Co., Ltd. 发明人 Hsu Jyh-Shiou;Yang Chi-Ming;Chuang Kuo-Sheng
分类号 B08B9/46;B08B9/08;H01L21/67;H01L21/673 主分类号 B08B9/46
代理机构 Duane Morris LLP 代理人 Duane Morris LLP
主权项 1. A system comprising: a housing; a cleaning unit in the housing, the cleaning unit comprising a cleaning chamber therein, configured to spray a cleaning medium into a container in the cleaning chamber and dry the container; an analyzing unit within the housing, the analyzing unit configured to analyze air inside the container coming out of the cleaning chamber, and provide a testing result for each ingredient of a possible airborne molecular contaminant (AMC) and humidity; a vacuum unit within the housing, the vacuum unit comprising a vacuum chamber configured to apply vacuum onto a container only when the testing result for an ingredient is higher than a respective threshold; at least one loading port configured to provide said container; an equipment front end module (EFEM) connected to the at least one loading port; a door opening area connected with the EFEM; a door closing area connected with the EFEM; and a buffer station between the door opening area and the cleaning chamber of the cleaning unit, and partially coupled between the analyzing unit and the door closing area, wherein the buffer station is configured to move the container into the cleaning chamber, and also configured to move the container from the analyzing unit to the door closing area, if the testing result for an ingredient is not higher than a respective threshold.
地址 Hsin-Chu TW