Vapor deposition system and method

摘要

A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity. A deposition method is also disclosed.

主权项

1. A deposition method, comprising:
providing a sloped gradient; providing a plurality of processing chambers along the sloped gradient; providing at least one fixture carrier assembly, the at least one fixture carrier assembly including an annular assembly frame having a frame opening, a fixture mount plate in the frame opening, at least one fixture opening in the fixture mount plate, at least one substrate fixture in the at least one fixture opening and the at least one substrate fixture having at least one lens support arm and a plurality of pivoting substrate contact blades, at least one of the plurality of pivoting contact blades pivotally carried by the at least one lens support arm; placing at least one substrate in the at least one substrate fixture; pivoting the at least one lens support arm with respect to the at least one substrate fixture and pivoting the plurality of pivoting substrate contact blades into contact with a substrate edge of the at least one substrate, the plurality of substrate contact blades limited to contact of the substrate at the substrate edge; and transporting the at least one fixture carrier assembly into and between the processing chambers along the sloped gradient under influence of gravity.