发明名称 Array substrate, preparation method for array substrate, and display device
摘要 The present invention discloses an array substrate, a preparation method for the array substrate, and a display device, wherein the array substrate comprises a gate electrode, a gate insulation layer, an active layer, a source electrode and a drain electrode, and a pixel electrode arranged on a substrate, the active layer includes an electric conduction area, a coverage area covered by the source electrode and the drain electrode, and an exposure area surrounding the coverage area, and the pixel electrode is lapped on the upper surfaces of the drain electrode, the exposure area of the active layer, and the gate insulation layer. According to the present invention, the pixel electrode breaks in the area, with the large gradient angle, of the drain electrode caused by slip-down due to gravity can be avoided, and the lap joint for the pixel electrode and the drain electrode is effectively facilitated.
申请公布号 US9583508(B2) 申请公布日期 2017.02.28
申请号 US201414499502 申请日期 2014.09.29
申请人 BOE TECHNOLOGY GROUP CO., LTD.;BEIJING BOE OPTOELECTRONICS CO., LTD. 发明人 Jiang Xiaohui;Guo Jian;Zhang Jiaxiang;Tian Zongmin
分类号 H01L27/12;H01L29/66;H01L29/423;H01L29/786;H01L29/417;H01L21/3213;H01L21/308;H01L21/027;H01L21/311 主分类号 H01L27/12
代理机构 Nath, Goldberg & Meyer 代理人 Nath, Goldberg & Meyer ;Goldberg Joshua B.;Blackman Scott
主权项 1. An array substrate, comprising a gate electrode, a gate insulation layer, an active layer, a source electrode and a drain electrode, and a pixel electrode which are arranged on a substrate, wherein the active layer includes an electric conduction area, a coverage area covered by the source electrode and the drain electrode, and an exposure area surrounding the outer side of the coverage area, and the pixel electrode is lapped on the upper surfaces of the drain electrode, the exposure area of the active layer, and the gate insulation layer, wherein the thickness of the coverage area of the active layer is greater than that of the exposure area of the active layer.
地址 Beijing CN