发明名称 |
Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same |
摘要 |
An exposure method may include: radiating a charged particle beam in an exposure system comprising a beam generator, radiating the beam, and main and auxiliary deflectors deflecting the beam to determine a position of a beam shot; determining whether a deflection distance from a first position of a latest radiated beam shot to a second position of a subsequent beam shot is within a first distance in a main field area of an exposure target area, the main field area having a size determined by the main deflector; setting a settling time according to the deflection distance so that a settling time of the subsequent beam shot is set to a constant minimum value, greater than zero, when the deflection distance from the first position to the second position is within the first distance; and deflecting the beam using the main deflector based on the set settling time. |
申请公布号 |
US9583305(B2) |
申请公布日期 |
2017.02.28 |
申请号 |
US201514632767 |
申请日期 |
2015.02.26 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Jung Yong-Seok;Tamamushi Shuichi;Noh In-Hwan;Shin In-Kyun;Lee Sang-Hee;Choi Jin |
分类号 |
H01J37/147;H01J37/317;H01J37/30 |
主分类号 |
H01J37/147 |
代理机构 |
Harness, Dickey & Pierce, P.L.C. |
代理人 |
Harness, Dickey & Pierce, P.L.C. |
主权项 |
1. An exposure method, comprising:
radiating a charged particle beam from a beam generator in an exposure system comprising the beam generator radiating the charged particle beam and main and auxiliary deflectors deflecting the beam radiated from the beam generator to determine a position of a beam shot on a substrate; determining whether a deflection distance from a first position of a latest radiated beam shot to a second position of a subsequent beam shot is within a first distance in a main field area of an exposure target area on the substrate, the main field area having a size determined by the main deflector; setting a settling time according to the deflection distance so that the settling time for stabilization of the subsequent beam shot is set to a constant minimum value, which is greater than zero, when the deflection distance from the first position to the second position is within the first distance; and deflecting the charged particle beam by using the main deflector to radiate the beam shot on the second position, based on the set settling time. |
地址 |
Gyeonggi-do KR |