发明名称 Transistors with uniform density of poly silicon
摘要 A transistor with uniform density of poly silicon includes a gate terminal, a drain terminal, and a source terminal. The gate terminal is constructed by a plurality of separated poly silicon, such that the density of the poly silicon is uniform.
申请公布号 US9583631(B1) 申请公布日期 2017.02.28
申请号 US201615072710 申请日期 2016.03.17
申请人 VIA ALLIANCE SEMICONDUCTOR CO., LTD. 发明人 Deng Jade;Ma Keith
分类号 H03M1/00;H01L29/786;H03M7/16;H03M1/66 主分类号 H03M1/00
代理机构 McClure, Qualey & Rodack, LLP 代理人 McClure, Qualey & Rodack, LLP
主权项 1. A current source device, comprising: a plurality of current source units, arranged along a plurality of rows and a plurality of columns of a current source array, wherein each of the current source units comprises a first amount of sub-units, wherein each of the sub-units comprises a second amount of first-type transistors, wherein the first-type transistors are coupled in series with each other and the sub-units are coupled in parallel with each other; a plurality of least significant bits, wherein each of the least significant bits comprises a third amount of the current source units; and a plurality of most significant bits, wherein each of the most significant bits comprises a fourth amount of the current source units, wherein the fourth amount is the third amount multiplied by a positive integer, wherein each of the current source units is constructed by a fifth amount of the first-type transistors, such that a poly silicon density of the first-type transistor is uniform to reduce an influence of a gradient in the poly silicon density of the current source units and to increase an output impedance of each of the current source units.
地址 Shanghai CN