发明名称 |
Lateral power MOSFET |
摘要 |
A lateral power MOSFET structure is disclosed. In some embodiments, a semiconductor device comprises substantially concentric source, channel, and drain regions; a metal layer at least in part comprising a drain plane disposed over the source, channel, and drain regions; and a metal layer at least in part comprising a source plane disposed over the source, channel, and drain regions. |
申请公布号 |
US9583478(B1) |
申请公布日期 |
2017.02.28 |
申请号 |
US201113089194 |
申请日期 |
2011.04.18 |
申请人 |
Silego Technology, Inc. |
发明人 |
Martinez Marcelo A. |
分类号 |
H01L27/02;H01L23/522;H01L23/528;H01L29/417;H01L25/07 |
主分类号 |
H01L27/02 |
代理机构 |
Van Pelt, Yi & James LLP |
代理人 |
Van Pelt, Yi & James LLP |
主权项 |
1. A semiconductor device, comprising:
a source region completely surrounded by substantially concentric channel and drain regions and a central body contact encircled by the source region; a first inner metal layer comprising a first drain plane disposed over the source, channel, and drain regions, wherein the first inner metal layer comprises a single plane that has one or more openings for connections; a second inner metal layer comprising a second drain plane disposed over the first inner metal layer, wherein the second inner metal layer comprises a single plane that has one or more openings for connections; and a top metal layer comprising a top source plane disposed over the inner metal layers, wherein the top source plane comprises a single plane that substantially comprises the top metal layer. |
地址 |
Santa Clara CA US |