发明名称 |
Sputter source for use in a semiconductor process chamber |
摘要 |
In some embodiments, a sputter source for a process chamber may include: a first enclosure having a top, sides and an open bottom; a target coupled to the open bottom; an electrical feed coupled to the top of the first enclosure proximate a central axis of the first enclosure to provide power to the target via the first enclosure; a magnet assembly having a shaft, a support arm coupled to the shaft, and a magnet coupled to the support arm disposed within the first enclosure; a first rotational actuator disposed off-axis to the central axis of the first enclosure and rotatably coupled to the magnet to rotate the magnet about the central axis of the first enclosure; and a second rotational actuator disposed off-axis to the central axis of the first enclosure and rotatably coupled to the magnet to rotate the magnet about a central axis of the magnet assembly. |
申请公布号 |
US9580795(B2) |
申请公布日期 |
2017.02.28 |
申请号 |
US201313785193 |
申请日期 |
2013.03.05 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
Miller Keith A.;Riker Martin Lee |
分类号 |
H01J37/34;C23C14/34 |
主分类号 |
H01J37/34 |
代理机构 |
Moser Taboada |
代理人 |
Moser Taboada ;Taboada Alan |
主权项 |
1. A sputter source for a process chamber, comprising:
a first enclosure having a top, sides and an open bottom; a target coupled to the open bottom of the first enclosure; an electrical feed coupled to the top of the first enclosure proximate a central axis of the first enclosure to provide power to the target via the first enclosure; a magnet assembly having a shaft, a support arm coupled to the shaft, and a magnet coupled to the support arm disposed within the first enclosure; a first rotational actuator disposed off-axis with respect to the central axis of the first enclosure and rotatably coupled to the magnet to rotate the magnet about the central axis of the magnet assembly; a second rotational actuator disposed off-axis with respect to the central axis of the first enclosure and rotatably coupled to the magnet to rotate the magnet about a central axis of the first enclosure; and a support column disposed through the central axis of the first enclosure, the support column fixed to the top of the first enclosure and the target. |
地址 |
Santa Clara CA US |