Method of manufacturing photomask blank and photomask blank

摘要

In a chamber (50), a quartz substrate (10) having a main surface on which an optical film (20) is formed is put on a susceptor (30). A flash lamp (60) is housed in a lamp house (90), and the optical film (20) is irradiated with flash light through two quartz plates (70a and 70b). A transmittance adjustment region (80) is formed on a surface of the quartz plate (70b) of the two quartz plates (70a and 70b), and the amount of light with which the optical film (20) is irradiated has in-plane distribution. If the optical film (20) is irradiated with the flash light, optical characteristics of the optical film (20) change depending on the received irradiation energy. Hence, for example, the characteristics of the optical film are not uniform, the optical film is irradiated with flash light having such irradiation energy distribution that cancels the in-plane distribution.

主权项

1. A method of manufacturing a photomask blank, comprising:
forming an optical film on a quartz substrate transparent to exposure light; and irradiating said optical film with flash lamp light, wherein said optical film is irradiated with the flash lamp light through a quartz plate on which a region with a different transmittance to the flash lamp light is formed, and wherein the quartz plate includes a light shielding film on a surface thereof, and the light shielding film has a thickness that is different correspondingly to the region with a different transmittance, and wherein said irradiating said optical film comprises forming the light shielding film on a transparent quartz plate, by: forming a light shielding film on an entire surface of a second quartz plate; then irradiating said second quartz plate with flash light having in-plane intensity distribution; and sublimating said light shielding film in accordance with irradiation intensity of the flash lamp light, to thereby deposit the sublimated light shielding film onto the transparent quartz plate.