发明名称 Plasma processing apparatus and plasma processing method
摘要 The plasma processing apparatus includes a dielectric member for defining a chamber, a gas introducing part for introducing a gas into the chamber, a discharge coil disposed on one side of the dielectric member and supplied with AC power to generate a plasma in the chamber into which the gas has been introduced, a conductor member disposed on the other side of the dielectric member and facing the discharge coil with the chamber of the dielectric member interposed therebetween, an AC power source for supplying AC voltage to the discharge coil, an opening communicating with the chamber and serving for applying the plasma to a substrate to be processed, and a moving mechanism for moving the substrate relative to the chamber so that the substrate passes across a front of the opening. The discharge coil is grounded or connected to the conductor member via a voltage generating capacitor or a voltage generating coil.
申请公布号 US9583313(B2) 申请公布日期 2017.02.28
申请号 US201414301450 申请日期 2014.06.11
申请人 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. 发明人 Okumura Tomohiro
分类号 C23C16/00;C23F1/00;H01L21/306;H01J37/32 主分类号 C23C16/00
代理机构 Wenderoth, Lind & Ponack, L.L.P. 代理人 Wenderoth, Lind & Ponack, L.L.P.
主权项 1. A plasma processing apparatus comprising: an inductively coupled plasma torch unit having a dielectric member for defining a chamber, a gas introducing part for introducing a gas into the chamber, a discharge coil disposed on one side of the dielectric member and supplied with AC power to generate a plasma in the chamber into which the gas has been introduced, and a conductor member disposed on the other side of the dielectric member and facing the discharge coil with the chamber of the dielectric member interposed therebetween; an AC power source for supplying AC voltage to the discharge coil; an opening communicating with the chamber and serving for applying the plasma to a substrate to be processed, the opening being a slot-like long opening; and a moving mechanism for moving the substrate relative to the inductively couple plasma torch unit so that the substrate passes across a front of the opening, wherein the discharge coil is grounded or connected to the conductor member via a voltage generating capacitor or a voltage generating coil, wherein the dielectric member includes a first ceramics block and a second ceramics block, the first ceramics block and the second ceramics block being in contact with each other so that the chamber and the opening are defined therebetween, and wherein the chamber is formed into an annular shape having a first linear portion communicating with the opening and extending in a longitudinal direction of the opening, a second linear portion extending with a distance to and in parallel to the first linear portion, and third and fourth linear portions for connecting both ends of the first and second linear portions, respectively.
地址 Osaka JP