Display device and manufacturing method thereof

摘要

A manufacturing method of a display device includes: forming a thin film transistor on a substrate; forming a pixel electrode connected to the thin film transistor in at least one of the plurality of pixel areas on the substrate; forming a sacrificial layer on the pixel electrode; forming an opening in the sacrificial layer by removing at least a part of the sacrificial layer; forming a roof layer on the sacrificial layer and forming a support member in the opening; forming an injection hole by patterning the roof layer to expose at least a part of the sacrificial layer; forming a microcavity between the pixel electrode and the roof layer by removing the sacrificial layer; forming a liquid crystal layer in the microcavity by injecting a liquid crystal material through the injection hole; and forming an encapsulation layer on the roof layer to seal the microcavity.

主权项

1. A manufacturing method of a display device, comprising:
forming a thin film transistor on a substrate, the substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in at least one of the plurality of pixel areas; forming a sacrificial layer on the pixel electrode; forming an opening in the sacrificial layer by removing at least a part of the sacrificial layer; forming a roof layer on the sacrificial layer and forming a support member in the opening; forming an injection hole by patterning the roof layer to expose at least a part of the sacrificial layer; forming a microcavity between the pixel electrode and the roof layer by removing the sacrificial layer, wherein a cross sectional area of the microcavity decreases in a direction towards the injection hole; forming a liquid crystal layer in the microcavity by injecting a liquid crystal material through the injection hole; and forming an encapsulation layer on the roof layer to seal the microcavity.