发明名称 SUBSTRATE SUPPORT STRUCTURE, VACUUM DRYING DEVICE AND VACUUM DRYING METHOD
摘要 The present disclosure provides a substrate support structure, a vacuum drying device and a vacuum drying method. The substrate support structure includes a support platform and a plurality of pins in the support platform. The plurality of pins is divided into at least two groups, and the at least two groups of pins are in the support platform in such a manner as to be liftable in the support platform, so that a substrate is supported by the at least two groups of pins alternately.
申请公布号 US2017051977(A1) 申请公布日期 2017.02.23
申请号 US201615147321 申请日期 2016.05.05
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 ZHAO Dejiang
分类号 F26B25/00;F26B5/12;H01L21/687 主分类号 F26B25/00
代理机构 代理人
主权项 1. A substrate support structure, comprising: a support platform and a plurality of pins in the support platform; wherein the plurality of pins is divided into at least two groups, and the at least two groups of pins are in the support platform in such a manner as to be liftable in the support platform, so that a substrate is supported by the at least two groups of pins alternately.
地址 Beijing CN