发明名称 Electroless Silver Plating Bath and Method of Using the Same
摘要 An electroless silver plating bath and method of use is presented within. The electroless silver plating bath is designed to plate only on the desired metal substrate while preventing plating on areas other than those which are to be plated. The invention uses heavy metal based stabilizers in the electroless silver plating bath to prevent extraneous plating. The ability to control the amount of stabilizer present in the plating bath allows for elimination of extraneous plating and allows for a stable bath. The electroless silver plating bath is very stable and yet plates at an acceptable rate. The electroless silver plating bath prevents corrosion on the underlying metal that is plated on by using the stabilizers as described herein. The silver plating bath presented herein is useful for a wide variety of applications including those in electronic packaging, integrated circuits (IC) and in manufacturing of light emitting diodes (LEDs).
申请公布号 US2017051411(A1) 申请公布日期 2017.02.23
申请号 US201514831403 申请日期 2015.08.20
申请人 MacDermid Acumen, Inc. 发明人 Kologe Jordan;Jin Lei;Long Ernest;Konefal Alexander;Yan Wei
分类号 C23C18/32;H01L33/62;H05K3/18;C23C18/16;C23C18/42 主分类号 C23C18/32
代理机构 代理人
主权项 1. An electroless silver plating composition comprising: a. a source of silver ions; b. a stabilizer comprising a heavy metal ion; c. a surfactant; d. a complexor; e. and a buffer.
地址 Waterbury CT US