| 摘要 |
The invention relates to a method for producing an optoelectronic component (1) with a heat-distribution layer (13), comprising the steps of: providing a substrate (3), and applying a first electrode layer (5), an active layer sequence (7), a second electrode layer (9) and a protective layer (11) in a stack direction (R). The method also comprises the step of applying the heat-distribution layer (13) in the stack direction (R) by means of cold spraying, and thus forming a transition region (17) in the stack direction (R) between the heat-distribution layer (13) and the protective layer (11). |
